JPH0441465B2 - - Google Patents
Info
- Publication number
- JPH0441465B2 JPH0441465B2 JP57232439A JP23243982A JPH0441465B2 JP H0441465 B2 JPH0441465 B2 JP H0441465B2 JP 57232439 A JP57232439 A JP 57232439A JP 23243982 A JP23243982 A JP 23243982A JP H0441465 B2 JPH0441465 B2 JP H0441465B2
- Authority
- JP
- Japan
- Prior art keywords
- ion
- resist
- ion beam
- exposure
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 11
- 239000004065 semiconductor Substances 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 229910052734 helium Inorganic materials 0.000 claims 1
- 239000001307 helium Substances 0.000 claims 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims 1
- 150000002500 ions Chemical class 0.000 description 19
- 230000035945 sensitivity Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000002164 ion-beam lithography Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57232439A JPS59117122A (ja) | 1982-12-23 | 1982-12-23 | 半導体素子製造装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57232439A JPS59117122A (ja) | 1982-12-23 | 1982-12-23 | 半導体素子製造装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59117122A JPS59117122A (ja) | 1984-07-06 |
JPH0441465B2 true JPH0441465B2 (en]) | 1992-07-08 |
Family
ID=16939278
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57232439A Granted JPS59117122A (ja) | 1982-12-23 | 1982-12-23 | 半導体素子製造装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59117122A (en]) |
-
1982
- 1982-12-23 JP JP57232439A patent/JPS59117122A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59117122A (ja) | 1984-07-06 |
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